Distortion pre-compensation in soft nanoimprint process for mix-and-match process with traditional UV lithography
Pré-compensation des distortions causés par nanoimpression souple pour procédé mix-and-match utilisant la lithographie UV traditionnelle
Résumé
Since its development by Stephen Y. Chou in 1996, Soft nanoimprint lithography [S-NIL] has proved to be a promising technique for replicating patterns from a master mold to another target substrate, being both quick and cost-effective compared to other lithography technologies. These properties make SNIL a strong candidate for the fabrication of cm-scale active metasurfaces. Indeed, the fabrication of active metasurfaces requires addressing independent control over each single nano-resonator of the pattern. Using SNIL in a mix-and-match process could then allow for the control of the nano-resonators on a bigger scale.
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